Maskless Laser Lithography and Direct-Write Technologies
for Advanced Micro- and Nanofabrication
May 7–8, 2026
Koç University, Istanbul, Türkiye
Koç University, Heidelberg Instruments, and GenISys, along with Nanoscribe and micro resist technology, invite the lithography community to join this free technical workshop gathering leading researchers, cleanroom managers, and industry experts for two intense days exploring maskless lithography and nanofabrication technologies for advanced applications.
Maskless lithography and direct-write technologies are key tools in research laboratories and small- to mid-volume microfabrication facilities worldwide. They enable rapid and flexible patterning for applications across MEMS, microfluidics, micro-optics, sensors, electronics, advanced packaging, and emerging quantum technologies.
About the Workshop
Designed for cleanroom managers, academic researchers, and industry users, this workshop offers deep insights into current advances, practical requirements, and fabrication strategies for 2D, 2.5D, and 3D micro- and nanostructures.
Overview of Maskless Lithography
This workshop provides an overview of maskless lithography with a focus on the Direct-Write Laser (DWL) systems and maskless aligners developed by Heidelberg Instruments, highlighting system capabilities, grayscale lithography, software environments, compatible materials, and user experiences from research and industrial settings.
Introduction of t-SPL and NanoFrazor
In addition, the program will introduce thermal scanning probe lithography (t-SPL)—a powerful method for high-resolution nanolithography and thermal modification. Using a heated ultra-sharp probe tip with real-time closed-loop depth control, t-SPL enables the creation of arbitrary nanoscale structures on a wide range of substrates. NanoFrazor systems from Heidelberg Instruments now deliver lithographic resolutions down to 20 nm while achieving significantly higher throughput through parallelized t-SPL with multiple heated tips, Direct Laser Sublimation (DLS), and an advanced automation framework.
Complementary Microfabrication Technologies
The workshop will also highlight complementary microfabrication technologies including two-photon polymerization (2PP) 3D printing for micro- and nanoscale structures using systems from Nanoscribe. This technique enables the fabrication of complex three-dimensional microstructures with sub-micron precision, supporting applications in micro-optics, metamaterials, biomedical devices, and advanced photonics.
Insights into Tools, Materials, and Software Solutions
Furthermore, participants will gain insight into simulation, modeling, and proximity effect correction tools for electron-beam and optical lithography using software solutions from GenISys GmbH, as well as metrology solutions for scanning electron microscopy (SEM). These tools play a critical role in optimizing pattern fidelity, improving process reliability, and accelerating nanofabrication workflows.
The program will also cover advanced photoresists and lithographic materials, including high-performance resists and process materials from micro resist technology GmbH that enable high-resolution patterning across multiple lithography platforms.
Multiple hands-on training session will be provided on Day 1, allowing participants to gain practical experience with selected systems and software tools.
Seats are limited. Registrations will be on a first-come, first-served basis.
Program Day 1
May 7 · 09:00 AM – 4:00 PM CET
| Time | Topic | Speaker |
|---|---|---|
| 09:00 AM | Welcome | Prof. Hakan Ürey Koç University |
| 09:20 AM | Keynote: Nanofabrication for Nano-Photonics at Southampton University | Prof. Martin Charlton University of Southampton |
| 09:50 AM | Bridging Research and Pilot Lines in the Turkish Context: Semiconductor Innovation at n2STAR | Prof. Erdem Alaca Koç University |
| 10:10 AM | Heidelberg Instruments – Solution Provider for R&D and Industry | Muhammed Bekin Heidelberg Instruments |
| 10:20 AM | Growing by Shrinking | Nezih Unal GenISys AS |
| 10:30 AM | Coffee Break | |
| 11:00 AM | Expanding the Lithography Toolbox | Vasilis Theofylaktopoulos Heidelberg Instruments Nano AG |
| 11:30 AM | Pushing the Limits in Grayscale and Binary Laser Lithography | Muhammed Bekin Heidelberg Instruments |
| 11:50 AM | Two-Photon Polymerization for Maskless Lithography and 3D Printing on the Microscale | Dr. Mina Yeşilyurt Nanoscribe GmbH & Co. KG |
| 12:15 PM | Lunch Break | |
| 01:00 PM | Metrology for Nano-Patterning: If You Cannot Measure It – You Cannot Improve It | Dmitri Titko GenISys GmbH |
| 01:30 PM – 04:00 PM | Hands-on Training Maskless Lithography, Two-Photon Lithography, GenISys BEAMER, NanoFrazor online demo Koç University n2STAR cleanroom (limited capacity) |
|
| 04:00 PM | End of Day 1 |
Program Day 2
May 8 · 09:00 AM – 1:00 PM CET
| Time | Topic | Speaker |
|---|---|---|
| 09:00 AM | Opening | Muhammed Bekin Heidelberg Instruments |
| 09:05 AM | Keynote: TBA | Dr. Armin Knoll IBM Zurich |
| 09:35 AM | High-Throughput Lithography Approaches for High-Resolution Nanophotonics | Assoc. Prof. Serap Aksu Ramazanoğlu Koç University |
| 10:05 AM | Update on Highlights in Resist and Photopolymer Development | Dr. Anja Voigt micro resist technology GmbH Online |
| 10:35 AM | Coffee Break | |
| 11:00 AM | Photolithography Applications with Direct Writers in ASELSAN | Olgu Demircioglu ASELSAN |
| 11:30 AM | Comparative Study of One- and Two-Photon Grayscale Lithography | Dr. Jonas Wiedenmann Heidelberg Instruments Online |
| 12:00 PM | Wrap-up Session and Q&A | |
| 01:00 PM | End of Day 2 – End of Workshop | |
| Afternoon tour @ n2STAR (flexible timing) | ||
Talks
Learn from Leading Experts in Micro- and Nanofabrication
Workshop Highlights
-
Highlight #1:
Hands-on training with the DWL 66+, a 2PP system, and software tools -
Highlight #2:
Expert presentations on maskless lithography, grayscale patterning, and nanofabrication workflows - Highlight #3:
Direct insights from research and industrial users on real-world applications
Frequently Asked Questions
How do I get to the event venue?
The workshop is located at Koç University in Istanbul, Türkiye. Information on how to get there can be found on the university's website. Detailed directions and parking information will be sent upon request.
Are there vegetarian or vegan meal options available during the event?
Yes. Refreshments and meals provided during the workshop will include vegetarian and vegan options.
Can I bring a colleague to the workshop?
Yes. You may register additional attendees from your organization. Each participant must complete a separate registration form due to limited seating availability.
Can I join multiple hands-on trainings?
No. Due to seat limitations and time restrictions we can only offer one training per person.
Cooperation partners:
