Nano-Micro-Lithography Symposium 2027

The Nano-Micro-Lithography Symposium 2027 (NMLS 2027) is a free 1.5-day in-person event hosted at IMS CHIPS – Institut für Mikroelektronik in Stuttgart, Germany, one of Europe’s leading research institutes for microelectronics and nanotechnology. Combining cutting-edge research with industrial application, IMS CHIPS plays an important role in technology transfer and supports the development of manufacturing-ready solutions.

Bringing together experts and users from Nanoscribe, Heidelberg Instruments, GenISys, micro resist technology, and Notion Systems, NMLS 2027 provides a platform for researchers, engineers, cleanroom managers, process developers, and industry professionals to exchange knowledge and discuss the latest advances in micro- and nanofabrication. Expert presentations, user case studies, and technology updates will explore lithography and direct-write technologies for applications in photonics, micro-optics, semiconductors, advanced packaging, MEMS, sensors, and emerging quantum technologies. Topics will include 2D, 2.5D, and 3D fabrication strategies, advanced materials, simulation and process optimization, and technologies such as two-photon lithography, thermal scanning probe lithography, and industrial inkjet printing.

With a focus on practical implementation and industrial workflows, the symposium will highlight approaches to accelerating product development, rapid prototyping, and process optimization – from R&D and small-series production to industrial manufacturing. Participants can also benefit from networking opportunities and a guided cleanroom tour of the host facility.

Participation is free of charge, but registration is required. Places are limited and will be allocated on a first-come, first-served basis.